2016年7月26日 星期二

Novel wet etch makes better finfets

University of Illinois researchers have developed a way to wet-etch tall clean fins for finfets. It works for indium phosphide, but not for silicon – yet. The aim was to etch tall fins with vertical sides and few surface blemishes. “We use a technique that gives a much higher aspect ratio, and the sidewalls are ...

Novel wet etch makes better finfets



from News – ElectronicsWeekly http://ift.tt/29X4GVe
via Yuichun

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