University of Illinois researchers have developed a way to wet-etch tall clean fins for finfets. It works for indium phosphide, but not for silicon – yet. The aim was to etch tall fins with vertical sides and few surface blemishes. “We use a technique that gives a much higher aspect ratio, and the sidewalls are ...
Novel wet etch makes better finfets
from News – ElectronicsWeekly http://ift.tt/29X4GVe
via Yuichun
沒有留言:
張貼留言