Imec and ASML are to accelerate the adoption of EUV lithography for high-volume production, including the current latest available equipment for EUV (0.33 Numerical Aperture, NA). Moreover they will explore the potential of the next-generation high-NA EUV lithography to enable scaling towards the post 3nm node. To this end, they will establish a joint high-NA ...
This story continues at Imec and ASML establish high-NA EUV lab for sub-3nm node
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