Researchers at Purdue University have surveyed research towards negative capacitance field-effect transistors (NC-FETs), and published their findings. This type of transistor has a ferroelectric layer (Hf02, for example) within the gate stack, which could allow is break the 60mV/decade sub-threshold slope limit for mosfets at room temperature. “Given the potential, there is a need for ...
This story continues at Are NC-FETs going to make it?
Or just read more coverage at Electronics Weekly
from News – Electronics Weekly https://ift.tt/2TD4rWf
via Yuichun
沒有留言:
張貼留言