TSMC is looking at an e-beam lithography tool made by the Dutch firm Mapper as a possible alternative to EUV. The Mapper tool uses 110 e-beams and could, according to TSMC’s Burn Lin, process 150 wafers an hour which is the same rate as ASML’s latest EUV machine. According to Lin, who is vp for ...
Read full article: TSMC looks at e-beam as possible alternative to EUV
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