Intel’s EUV manager told this week’s SPIE Advanced Lithography Conference that EUV may not be ready for 7nm. Dr. Britt Turkoff pointed to a number of potential show-stoppers. The old bug-bear of light-source power is still with us with 250W needed and not much more than 150W attainable. Photoresist and pellicles are also in need ...
Read full article: EUV may not be ready for 7nm
from News – Electronics Weekly http://ift.tt/2mOawu7
via Yuichun
沒有留言:
張貼留言