Researchers from Tokyo University have uncovered molecular properties that help fill nanometer-sized gaps in the nanopatterning mould for ultraviolet nanoimprint lithography. Ultraviolet nanoimprint lithography (UV-NIL) is a method of creating patterns at the nanoscale with widespread applications in optoelectronics, photonics, and biology due to its low cost and scalability. However, current UV-NIL resolution is limited ...
The post UV-NIL extended to below 10nm appeared first on Electronics Weekly.
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