Imec uses 13.5nm High Harmonic Generation source to print 20nm line pitch

Imec reports the use,  for the first time, of a 13.5 nm High Harmonic Generation source for the printing of 20nm pitch line/spaces using interference lithographic imaging of an Inpria metal-oxide resist under high-numerical-aperture (high-NA) conditions. The demonstrated high-NA capability of the EUV interference lithography using this EUV source presents an important milestone of the ...

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