KLA-Tencor has introduced three advanced reticle inspection systems that address 10nm and below mask technologies: the Teron 640, Teron SL655 and Reticle Decision Center (RDC). All three systems are key to enabling both current and next-generation mask designs, so that mask shops and IC fabs can more efficiently identify lithographically significant and severe yield-damaging defects.
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via Yuichun
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