Self-assembling polymers could boost the resolution of lithography, according to modelling at the University of Chicago and US Argonne National Laboratory. Belgian research lab IMEC is testing the theory. Block copolymers will self-assemble when coated onto a patterned surface. The trick is to pre-pattern the surface well enough so that the lowest energy state for ...
Self-organised photo-resist boosts lithography
from ElectronicsWeekly » News http://ift.tt/1OQYRVJ
via Yuichun
沒有留言:
張貼留言