Cymer delivers 2nd gen solution for reduction of neon consumption on ArF light sources

Cymer, an ASML company engaged in the development of lithography light sources used by chipmakers to pattern advanced semiconductor chips, has announced the availability of its second-generation solution to reduce the consumption of neon gas in ArF light sources.

from DIGITIMES: IT news from Asia http://ift.tt/1IXLe6w
via Yuichun